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AB171531

650 nm Stop Solution for TMB Substrate

650 nm Stop Solution for TMB Substrate

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(1 Publication)

Abcam's 650 nm Stop Solution for TMB Substrate is a ready-to-use solution for colorimetric HRP-based ELISA detection.

Key facts

アプリケーション

ELISA

applications

製品の状態

Liquid

form

バッファー組成

pH: 7.5 - 11.5 Constituents: 2.99% Sodium fluoride

storage-buffer

Reactivity data

{ "title": "Reactivity Data", "filters": { "stats": ["", "Reactivity", "Dilution Info", "Notes"] }, "values": { "ELISA": { "reactivity":"TESTED_AND_REACTS", "dilution-info":"", "notes":"<p>Equal volumes of TMB ELISA Substrate and 650 nm Stop Solution for TMB Substrate should be used.</p>" }, "IHC-P": { "reactivity":"TESTED_AND_DOES_NOT_REACT", "dilution-info":"", "notes":"<p></p>" }, "IHC-Fr": { "reactivity":"TESTED_AND_DOES_NOT_REACT", "dilution-info":"", "notes":"<p></p>" } } }

製品の詳細

Abcam's 650 nm Stop Solution for TMB Substrate is a ready-to-use solution for colorimetric HRP-based ELISA detection. The acidic formulation is a proprietary solution used to stop TMB ELISA Substrate reactions (ab171522, ab171523, ab171524, ab171525, ab171526 and ab171527) in the blue range of 620 nm to 650 nm.

Product Use:
Equal volumes of TMB ELISA Substrate and 650 nm Stop Solution for TMB Substrate should be used.

Storage Instructions:

Product should be stored at 2-8°C. Exposure to direct sunlight and other UV sources should be avoided due to the light sensitive nature of the TMB molecule.

出荷温度及び保存条件

出荷温度
Ambient - Can Ship with Ice
短期保存温度
+4°C
長期保存温度
+4°C

製品プロトコール

ターゲットの情報

文献 (1)

Recent publications for all applications. Explore the full list and refine your search

Proceedings of the National Academy of Sciences of the United States of America 119:e2119676119 PubMed35235462

2022

CD164 is a host factor for lymphocytic choriomeningitis virus entry.

Applications

Unspecified application

Species

Unspecified reactive species

Mark J G Bakkers,Alex Moon-Walker,Rasmus Herlo,Vesna Brusic,Sarah Hulsey Stubbs,Kathryn M Hastie,Erica Ollmann Saphire,Tomas L Kirchhausen,Sean P J Whelan
View all publications

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